Semiconductor device and method of manufacturing the same

ABSTRACT

A semiconductor device comprises a plurality of gate structures formed on a substrate, a gate spacer formed on a sidewall of the gate structures, a semiconductor pattern formed on the substrate between the gate structures, a first impurity region and a second impurity region formed in the semiconductor pattern and at surface portions of the substrate, respectively, wherein the first and second impurity regions include a first conductive type impurity, and a channel doping region surrounding the first impurity region, wherein the channel doping region includes a second conductive type impurity.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a divisional of U.S. application Ser. No. 11/171,710filed on Jun. 30, 2005, which claims priority under 35 U.S.C. § 119 toKorean Patent Application No. 2004-52685 filed on Jul. 7, 2004, thedisclosures of which are herein incorporated by reference in theirentirety.

TECHNICAL FIELD

The present disclosure relates to a semiconductor device and a method ofmanufacturing the same, and more particularly to a semiconductor memorydevice including a transistor and a method of manufacturing the same.

DISCUSSION OF RELATED ART

Integration degree, reliability and the response speed of semiconductordevices need to be improved to operate the semiconductor devices at ahigh speed and to have a large storing capacitance.

A dynamic random access memory (DRAM) device is an example of thesemiconductor device having characteristics of a large storingcapacitance and a high facility of storing and erasing data. The DRAMdevice includes a memory cell for storing data using electric chargesand peripheral circuits for transferring the electric charges as aninput/output of the data. The memory cell includes an access transistorand a capacitor.

A recent high integration trend of semiconductor devices requires thetransistor and the capacitor of the memory device to occupy a smallerspace. Thus, it is difficult to maintain a stable and steady operationin the memory device, which is important when a design rule of thememory device is smaller than about 0.1 μm.

For example, it becomes difficult to overcome a short channel effect asa gate length of a memory device is shortened. As a junction leakagecurrent is increased, a data retention time is reduced and a refreshcharacteristic is deteriorated. A contact area of a contact plug thatcontacts with a source/drain is reduced. Thus, an electrical resistanceof the contact plug is increased and becomes an obstacle to the stableand steady operation of the memory device.

Recently, a recessed transistor for overcoming the short channel effecthas been studied. The recessed transistor is formed in a trench of asubstrate known as a gate trench. However, the recessed transistor has aproblem in that an operation characteristic of a left portion of thetransistor is different from that of a right portion of the transistorwhen the gate trench on the substrate is not aligned to a gate electrodepattern. The recessed transistor also has a problem in that a parasitecapacitance of a word line is increased in a memory device since asurface of a gate oxide layer is increased as compared with aconventional planar transistor. The increased parasite capacitancereduces an operation speed of the recessed transistor.

SUMMARY OF THE INVENTION

Exemplary embodiments of the present invention provides a semiconductordevice including a transistor for reducing a junction leakage currentand an electrical resistance of a contact at source/drain regions and amethod of manufacturing same.

According to an embodiment of the present invention, a semiconductordevice comprising a plurality of gate structures is formed on asubstrate, and a gate spacer is formed on a sidewall of the gatestructures. A semiconductor pattern is formed on the substrate betweenthe gate structures. A first impurity region is formed in thesemiconductor pattern and a second impurity region is formed at surfaceportions of the substrate. The first and second impurity regionsincludes a first conductive type impurity. A channel doping region isformed below the first impurity region to surround the first impurityregion, and the channel doping region is doped with a second conductivetype impurity.

According to another embodiment of the present invention, asemiconductor device comprises a substrate including a gate trench, aplurality of gate structures formed on the substrate, and a gate spacerformed on a sidewall of the gate structures. A lower portion of eachgate structure is formed in the trench, and the gate spacer is formed ona portion of a sidewall of each of the gate structures protruded fromthe substrate. A semiconductor pattern on exposed portions of thesubstrate between the gate spacers is formed. A first impurity region isformed in the semiconductor pattern and a second impurity region isformed at surface portions of the substrate, and the first and secondimpurity regions include a first impurity. A channel doping region isformed under the first impurity region and includes a second impurity.

According to another embodiment of the present invention, a method ofmanufacturing a semiconductor device comprises forming a plurality ofgate structures on a substrate, forming a gate spacer on a sidewall ofeach gate structure, forming a semiconductor pattern on exposed portionsof the substrate between the gate spacers, forming a channel dopingregion in the substrate between predetermined adjacent gate spacers byimplanting a second conductive type impurity onto the semiconductorpattern, and forming a first impurity region and a second impurityregion in the semiconductor pattern and at surface portions of thesubstrate by implanting a first conductive type impurity onto thesemiconductor pattern, wherein the first impurity region is surroundedby the channel doping region.

According to another embodiment of the present invention, a method ofmanufacturing a semiconductor device comprises forming a plurality ofgate structures on a substrate, forming a gate spacer on a sidewall ofeach of the plurality of gate structures, forming a semiconductorpattern on exposed portions of the substrate between the gate spacers,implanting first dopants onto the substrate including the semiconductorpattern for forming a first impurity region and a second impurity regionin the semiconductor pattern at surface portions of the substrate,forming a first insulation interlayer on the substrate including theplurality of gate structures for covering the plurality of gatestructures with the first insulation interlayer, forming first andsecond contact pads through the first insulation interlayer, wherein thefirst contact pad contacts the first impurity region and the secondcontact pad contacts the second impurity region, forming a secondinsulation interlayer on the first insulation interlayer and the firstand second contact pads, forming a contact hole in the second insulationinterlayer for exposing the first contact pad through the contact hole,and implanting second dopants onto a bottom of the contact hole to forma channel doping region under the first impurity region, wherein thefirst impurity region is surrounded by the channel doping region.

According to another embodiment of the present invention, a method ofmanufacturing a semiconductor device comprises forming a plurality ofgate trenches on a substrate by partially etching the substrate, forminga plurality of gate structures on the substrate, wherein a lower portionof at least some of the plurality of gate structures is formed in theplurality of gate trenches, forming a gate spacer on a portion of asidewall of each gate structure protruded from the substrate, forming asemiconductor pattern on the substrate between the plurality of gatestructures, forming a channel doping region in the substrate betweenpredetermined adjacent gate spacers by implanting a second conductivetype impurity onto the semiconductor pattern, and forming a firstimpurity region and a second impurity region in the semiconductorpattern and at surface portions of the substrate by implanting a firstconductive type impurity onto the semiconductor pattern, wherein thefirst impurity region is surrounded by the channel doping region.

According to another exemplary embodiment of the present invention, amethod of manufacturing a semiconductor device comprises forming aplurality of gate trenches on a substrate by partially etching thesubstrate, forming a plurality of gate structures on the substrate,wherein a lower portion of at least some of the plurality of gatestructures is formed in the plurality of gate trenches, forming a gatespacer on a portion of a sidewall of each gate structure protruded fromthe substrate, forming a semiconductor pattern on the substrate betweenthe plurality of gate structures, implanting a first impurity onto thesubstrate including the semiconductor pattern for forming a firstimpurity region and a second impurity region in the semiconductorpattern and at surface portions of the substrate, forming a firstinsulation interlayer on the substrate including the plurality of gatestructures for covering the plurality of gate structures with the firstinsulation interlayer, forming first and second contact pads through thefirst insulation interlayer, wherein the first contact pad contacts thefirst impurity region and the second contact pad contacts the secondimpurity region, forming a second insulation interlayer on the firstinsulation interlayer and the first and second contact pads, forming acontact hole in the second insulation interlayer for exposing the firstcontact pad through the contact hole, and implanting a second impurityonto a bottom of the contact hole to thereby form a channel region belowthe first impurity region, wherein the first impurity region issurrounded by the channel region.

According to embodiments of the present invention, a channel dopingregion of a transistor contacts one of the impurity regions. Thus, ajunction leakage current is reduced at the impurity regions that do notcontact the channel-doping region. The semiconductor pattern on thesubstrate between the gate structures increases a contact area of acontact pad to minimize an electrical resistance of the contact pad andimprove an operation characteristic of a DRAM device.

BRIEF DESCRIPTION OF THE DRAWINGS

Preferred embodiments of the present disclosure can be understood inmore detail from the following descriptions taken in conjunction withthe accompanying drawings in which:

FIG. 1 is a cross sectional view illustrating a DRAM device including aplanar gate electrode according to an embodiment of the presentinvention;

FIGS. 2 to 6 are cross sectional views illustrating processing steps formanufacturing the DRAM device shown in FIG. 1 according to an embodimentof the present invention;

FIGS. 7 to 11 are cross sectional views illustrating processing stepsfor manufacturing the DRAM device shown in FIG. 1 according to anotherembodiment of the present invention;

FIG. 12 is a cross sectional view illustrating a DRAM device including arecessed gate electrode according to an embodiment of the presentinvention;

FIGS. 13 to 15 are cross sectional views illustrating processing stepsfor manufacturing the DRAM device shown in FIG. 12 according to anembodiment of the present invention;

FIGS. 16 and 17 are cross sectional views illustrating processing stepsfor manufacturing the DRAM device shown in FIG. 12 according to anotherembodiment of the present invention; and

FIGS. 18 to 22 are cross sectional views illustrating processing stepsfor manufacturing a DRAM device according to still another embodiment ofthe present invention.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

Preferred embodiments of the present invention will be described belowin more detail with reference to the accompanying drawings. The presentinvention may, however, be embodied in different forms and should not beconstrued as limited to the embodiments set forth herein. Rather, theseembodiments are provided so that this disclosure will be thorough andcomplete, and will fully convey the scope of the present invention tothose skilled in the art.

FIG. 1 is a cross sectional view illustrating a DRAM device including aplanar gate electrode according to an embodiment of the presentinvention.

Referring to FIG. 1, a semiconductor substrate 10 such as a siliconwafer is separated into a field region 12 and an active region. A deviceisolation layer is formed in the field region 12 by a trench isolationprocess.

A gate structure 20 is formed on the active region of the substrate 10as a linear pattern shape, and includes a gate insulation pattern 14, agate conductive pattern 16 and a hard mask pattern 18 that aresequentially stacked on the substrate 10. The gate insulation pattern 14comprises a silicon oxide. The gate conductive pattern 16 includes apolysilicon pattern, a composite pattern in which a polysilicon layerand a metal layer are sequentially stacked or a composite pattern inwhich a polysilicon layer and a metal silicide layer are sequentiallystacked. The hard mask pattern 18 comprises a silicon nitride. A gatespacer 22 is formed to cover the side surface of the gate structure 20.In an embodiment of the present embodiment, the gate spacer 22 comprisesa silicon nitride.

A semiconductor pattern 24 is formed on a surface of the substrate 10between the gate spacers 22. A gap between two gate spacers 22 adjacentto each other is partially filled with the semiconductor pattern 24.First and second impurity regions 30 and 31 are formed on a surface andat surface portions of the substrate 10 corresponding to thesemiconductor pattern 24. In an embodiment of the present invention, thefirst and second regions 30, 31 include N type impurities (or are dopedwith N type impurities), and function as source and drain regions of atransistor, respectively. The first impurity region 30 makes anelectrical contact with a bit line, and the second impurity region 31makes an electrical contact with a capacitor.

The N type impurities are heavily doped (or implanted) on the surface ofthe substrate 10 in the semiconductor pattern 24 in the first and secondimpurity regions 30 and 31, which are referred to as heavily dopedregions 30 a and 31 a of the first and second impurity regions 30 and31, respectively. The N type impurities are lightly doped at the surfaceportions of the substrate 10 below the semiconductor pattern 24 in thefirst and second impurity regions 30 and 31, which are referred to aslightly doped regions 30 b and 31 b of the first and second impurityregions 30 and 31, respectively. Lightly doped impurities in the lightlydoped regions 30 b and 31 b reduce a reverse junction current tominimize a bulk leakage current.

A channel doping region 28 is formed below the first impurity region 30,so that the first impurity region 30 is surrounded by the channel dopingregion 28. In an embodiment of the present invention, the channel dopingregion 28 is heavily doped with P type impurities, and is spaced apartfrom the second impurity region 31.

A first insulation interlayer 26 is formed on the substrate 10 with asufficient thickness to cover the gate structure 20, and a plurality ofcontact pads 32 is formed through the first insulation interlayer 26.Each of the contact pads 32 makes an electrical contact with the firstimpurity region 30 or the second impurity region 31. The contact pad 32of an embodiment of the present invention makes contact with a surfaceof the semiconductor pattern 24, which is higher than the surface of thesubstrate 10. As a result, a contact area of the contact pad in anembodiment of the present invention is larger than that of a contact padthat contacts the surface of the substrate 10.

A second insulation interlayer 34 is formed on the first insulationinterlayer 26 and the contact pads 32. A bit line contact 36 is formedthrough the second insulation interlayer 34, and contacts the contactpad 32. A bit line 38 is formed on the second insulation interlayer 34and contacts the bit line contact 36.

A third insulation interlayer 40 is formed on the second insulationinterlayer 34 with a sufficient thickness to cover the bit line 38. Astorage node contact 42 is formed through the third insulationinterlayer 40, and electrically contacts the second impurity region 31.A cylindrical capacitor 44 is formed on the storage node contact 42.

According to an embodiment of the present invention, the channel dopingregion 28 only surrounds the first impurity region 30, and does notsurround the second impurity region 31. A threshold voltage of a gate inthe transistor can be controlled by the P type impurities in the channeldoping region 28 around the first impurity region 30. Since no P typeimpurities remain around the second impurity region 31, an intensity ofan electric field can be reduced at a junction point crossing the secondimpurity region 31. Accordingly, a leakage current leaked from thejunction point is reduced. Thus, the data retention time is increasedand the refresh characteristic of the transistor is improved.

The first and second impurity regions 30 and 31 extend to surfaceportions of the semiconductor pattern 24 from the surface portions ofthe substrate 10. Thus, contact areas between the contact pads 32 andthe first and second impurity regions 30 and 31 are increased ascompared with a conventional technology. As a result, an electricalresistance between the contact pads 32 and the first and second impurityregions 30 and 31 is sufficiently reduced, thereby increasing a drivingcurrent for driving the transistor and the operation speed of thetransistor.

FIGS. 2 to 6 are cross sectional views illustrating processing steps formanufacturing the DRAM device shown in FIG. 1 according to an embodimentof the present invention.

Referring to FIG. 2, a semiconductor substrate 10 such as a siliconwafer is separated into a field region 12 and an active region by atrench isolation process. The field region 12 of the substrate 10 isetched to form a trench, and an isolation layer (or a field oxide layer)is formed in the trench, thus the active region of the substrate 10 iselectrically isolated from surroundings by the isolation layer.

A thermal oxidation process is conducted on a surface of the substrate10, and a gate oxide layer is formed on the surface of the substrate 10as a gate insulation layer. A gate conductive layer is formed on thegate insulation layer, and a hard mask layer is formed on the gateconductive layer. The gate conductive layer includes a polysilicon layeror a composite layer having a polysilicon layer and a metal layer. Thecomposite layer may include the polysilicon layer and a metal silicidelayer in place of the metal layer. The hard mask layer comprises siliconnitride.

The hard mask layer is patterned to form a hard mask pattern 18, and thegate conductive layer and the gate insulation layer are etched using thehard mask pattern 18 as an etching mask to form a gate conductivepattern 16 and a gate insulation pattern 14. That is, the gate structure20 includes the gate insulation pattern 14, the gate conductive pattern16 and the hard mask pattern 18 that are stacked on the substrate 10.

A silicon nitride layer is coated on the substrate 10 with a sufficientthickness to cover the gate structure 20, and is anisotropically etcheduntil a surface of the substrate 10 is exposed. Accordingly, a gatespacer 22 is formed on a sidewall of the gate structure 20.

Referring to FIG. 3, a selective epitaxial growth (SEG) process isconducted on the exposed surface of the substrate 10 between the gatespacers 22 so that semiconductor materials are grown from the surface ofthe substrate 10 to form a semiconductor pattern 24. The SEG processselectively forms the semiconductor pattern 24 only on the exposedsurface of the substrate 10. In an embodiment of the present invention,the semiconductor pattern 24 partially fills up a gap between the gatespacers 22. If the semiconductor pattern 24 fills up most of the gapbetween the gate spacers 22, a short circuit may be generated among thesemiconductor patterns 24. The semiconductor pattern 24 may comprisesilicon or silicon germanium, and may comprise the same material as thesubstrate 10.

Referring to FIG. 4, a photoresist is coated on the substrate 10including the semiconductor pattern 24 and the gate structure 20 to forma photoresist film on the substrate 10. The photoresist film ispartially removed by exposing and developing processes to form aphotoresist pattern 27. One of the semiconductor patterns 24 between thegate structures 20 is exposed through the photoresist pattern 27.

P type dopants are implanted at surface portions of the substrate 10using the photoresist pattern 27 as an ion implantation mask to form achannel doping region 28 under the exposed semiconductor pattern 24. Thechannel doping region 28 is formed under the exposed semiconductorpattern 24 and under portions of the gate structures 20 that areadjacent to each other, and contacts the exposed semiconductor pattern24. In a subsequent process, the exposed semiconductor pattern 24 on thechannel doping region 28 makes an electrical contact with a bit line.

Referring to FIG. 5, the photoresist pattern 27 is removed by ashing andstripping processes. N type dopants are implanted onto the substrate 10including the semiconductor pattern 24.Thus, first and second impurityregions 30 and 31 are formed in the semiconductor pattern 24 and atsurface portions of the substrate 10 as source/drain regions of thetransistor. The implantation of the N type dopants is controlled suchthat the first impurity region 30 is formed in the channel doping region28 so that the first impurity region 30 is surrounded by the channeldoping region 28.

In the first and second impurity regions 30 and 31, the N type dopantsare heavily implanted onto the semiconductor pattern 24 that contacts acontact pad in a subsequent process, and are lightly implanted at thesurface of the substrate 10. The N type dopants are lightly implantedonto the semiconductor pattern 24 and at the surface of the substrate 10such that an implantation depth is higher than a bottom of the channeldoping region 28. Then the N type dopants are heavily implanted atsurface portions of the semiconductor pattern 24 to such a smallimplantation depth that the N type dopants are not implanted at thesurface of the substrate 10.

The surface portions of the semiconductor pattern 24 are heavily dopedwith the N type dopants to minimize an electrical resistance of thecontact pad. The surface portions of the substrate 10 are lightly dopedwith the N type dopants to thereby reduce a reverse junction current anddecrease the junction leakage current. The first impurity region 30makes electrical contact with a bit line in a subsequent process, andthe second impurity region 31 makes electrical contact with a capacitorin a subsequent process.

When the substrate 10 is heat-treated, the implanted dopants arediffused to surroundings in the semiconductor pattern 24 and thesubstrate 10. In an embodiment of the present invention, the heattreatment process is controlled such that the channel doping region 28does not contact the second impurity region 31 in the substrate 10 sothat the channel doping region 28 only surrounds the first impurityregion 30. As a result, the P type dopants scarcely remain around thesecond impurity region 31. Thus, an intensity of an electric fieldaround the second impurity region 31 is reduced to minimize the junctionleakage current. A threshold voltage of a transistor may be controlledby regulating an impurity concentration of the channel doping region 28under the first impurity region 30.

Referring to FIG. 6, a first insulation interlayer 26 is formed on thesubstrate 10 with a sufficient thickness to cover the gate structure 20,and is partially etched to form a first contact hole through which asurface of the semiconductor pattern 24 is exposed in the first andsecond impurity regions 30 and 31. A conductive material is coated onthe first insulation interlayer 26 with a sufficient thickness to fillup the first contact hole to form a conductive layer (not shown) on thefirst insulation interlayer 26. The conductive layer is then removed andplanarized until a surface of the first insulation interlayer 26 isexposed so that the conductive layer remains only in the first contacthole to form a plurality of contact pads 32 through the first insulationinterlayer 26. Hereinafter, the contact pad 32 making electrical contactwith the first impurity region 30 is referred to as a first contact pad32 a, and the contact pad 32 making an electrical contact with thesecond impurity region 31 is referred to as a second contact pad 32 b. Asurface area of the semiconductor pattern 24 is larger than that of thesubstrate 10 between the gate structures 20. Thus, the contact pad 32has a smaller electrical resistance than when making direct contact withthe substrate 10 between the gate structures 20. As a result, a drivingcurrent of the transistor is increased and an operation speed is alsoincreased.

Referring to FIG. 1 again, a second insulation interlayer 34 is formedon the first insulation interlayer 26 and the contact pads 32, and ispartially etched to form a second contact hole through which the firstcontact pad 32 a is exposed. Then, a conductive layer is formed on thesecond insulation interlayer 34 with a sufficient thickness to fill upthe second contact hole. The conductive layer is then patterned by aknown method so that a bit line contact 36 making an electrical contactwith the first contact pad 32 a is formed in the second contact hole anda bit line 38 is formed to be connected to the bit line contact 36.

A third insulation interlayer 40 is formed on the second insulationinterlayer 34, and the bit line 38 is covered with the third insulationinterlayer 40. The third insulation interlayer 40 and the secondinsulation interlayer 34 are sequentially and partially etched to form athird contact hole through which the second contact pad 32 b is exposed.A conductive layer is formed on the third insulation interlayer 40 witha sufficient thickness to fill up the third contact hole. The conductivelayer is removed and planarized until the third insulation layer 40 isexposed so that the conductive layer remains in the third contact holeto form a storage node contact hole 42. A cylindrical capacitor 44 isformed on the storage node contact hole 42 to complete the DRAM deviceshown in FIG. 1.

FIGS. 7 to 11 are cross sectional views illustrating processing stepsfor manufacturing the DRAM device shown in FIG. 1 according to anotherembodiment of the present invention.

Referring to FIG. 7, the same processing steps as described withreference to FIGS. 2 and 3 are performed. Briefly describing theprocessing steps above, a semiconductor substrate 10 is separated into afield region 12 and an active region by a trench device isolationprocess, and a gate structure 20 is formed on the substrate 10 such thatthe gate insulation pattern 14, the gate conductive pattern 16 and thehard mask pattern 18 are stacked. A gate spacer 22 is formed on asidewall of the gate structure 20. A selective epitaxial growth (SEG)process is conducted on the exposed surface of the substrate 10 betweenthe gate spacers 22 so that semiconductor materials are grown from thesurface of the substrate 10 to form a semiconductor pattern 24. The SEGprocess selectively forms the semiconductor pattern 24 only on theexposed surface of the substrate 10.

N type dopants are implanted onto the substrate 10 including thesemiconductor pattern 24. Thus, first and second impurity regions 50 and51 are formed in the semiconductor pattern 24 and at surface portions ofthe substrate 10 as a source/drain of a transistor. In the first andsecond impurity regions 50 and 51, the N type dopants are heavilyimplanted onto the semiconductor pattern 24 that contacts a contact padin a subsequent process. The N type dopants are lightly implanted at thesurface of the substrate 10. Electrical resistance of the contact pad isminimized at the surface portions of the semiconductor pattern 24 due tothe heavily doped N type dopants. A reverse junction current is reducedat the surface of the substrate 10 due to the lightly doped N typedopants, thereby decreasing the junction leakage current. The firstimpurity region 50 makes electrical contact with a bit line in asubsequent process, and the second impurity region 51 makes electricalcontact with a capacitor in a subsequent process.

Referring to FIG. 8, a first insulation interlayer 26 is formed on thesubstrate 10 with a sufficient thickness to cover the gate structure 20,and is partially etched to form a first contact hole through which asurface of the semiconductor pattern 24 is exposed in the first andsecond impurity regions 50 and 51. A conductive material is coated onthe first insulation interlayer 26 with a sufficient thickness to fillup the first contact hole to form a conductive layer on the firstinsulation interlayer 26. The conductive layer is removed and planarizeduntil a surface of the first insulation interlayer 26 is exposed so thatthe conductive layer remains only in the first contact hole to therebyform a plurality of contact pads 32 through the first insulationinterlayer 26. Hereinafter, the contact pad 32 making an electricalcontact with the first impurity region 50 is referred to as a firstcontact pad 32 a, and the contact pad 32 making an electrical contactwith the second impurity region 51 is referred to as a second contactpad 32 b. A surface area of the semiconductor pattern 24 is larger thanthat of the substrate 10 between the gate structures 20. Thus, thecontact pad 32 has a smaller electrical resistance than when makingdirect contact with the substrate 10 between the gate structures 20. Asa result, a driving current of the transistor is increased and anoperation speed is also increased.

Referring to FIG. 9, a second insulation interlayer 34 is formed on thefirst insulation interlayer 26 and the contact pads 32. A photoresistfilm is coated on the second insulation interlayer 34, and aconventional exposing and developing processes are performed to form aphotoresist pattern 60 through which a portion of the second insulationinterlayer 34 corresponding to the first contact pad 32 a is exposed.Then, the second insulation interlayer 34 is etched using thephotoresist pattern as an etching mask to form a second contact hole 62through which a top surface of the first contact pad 32 a is exposed.

Referring to FIG. 10, a plurality of P type dopants are implanted ontothe substrate 10 using the photoresist pattern 60 as an ion implantationmask so that a channel-doping region 64 is formed under the firstimpurity region 50. Here, the P type dopants are implanted to animplantation depth greater than a junction depth of the first impurityregion 50 so that the channel-doping region 64 surrounds the firstimpurity region 50. Then, a heat-treating is conducted on the substrate10 to diffuse the impurities in the substrate 10 so that thechannel-doping region 64 does not contact the second impurity region 51.

In an embodiment of the present invention, the photoresist pattern 60for forming the second contact hole 62 is used as the ion implantationmask for the channel doping region 64. Thus, unlike the previousembodiment, an additional photoresist pattern for forming the channeldoping region 64 is not needed.

Referring to FIG. 11, the photoresist pattern 60 is removed by ashingand stripping processes, and a conductive layer is formed on the secondinsulation interlayer 34 with a sufficient thickness to fill up thesecond contact hole 62. The conductive layer is then patterned so that abit line contact 36 making an electrical contact with the first contactpad 32 a is formed in the second contact hole 62, and a bit line 38 isformed to be connected to the bit line contact 36.

A third insulation interlayer 40 is formed on the second insulationinterlayer 34, and the bit line 38 is covered with the third insulationinterlayer 40 as shown in FIG. 1. The third insulation interlayer 40 andthe second insulation interlayer 34 are sequentially and partiallyetched to thereby form a third contact hole through which the secondcontact pad 32 b is exposed. A conductive layer is formed on the thirdinsulation interlayer 40 with a sufficient thickness to fill up thethird contact hole, and the conductive layer is removed and planarizeduntil the third insulation layer 40 is exposed so that the conductivelayer remains in the third contact hole to form a storage node contacthole 42. A cylindrical capacitor 44 is formed on the storage nodecontact hole 42 to complete the DRAM device shown in FIG. 1.

According to an embodiment of the present invention, an additionalphotoresist pattern for forming the channel doping region is notrequired.

FIG. 12 is a cross sectional view illustrating a DRAM device including arecessed gate electrode according to an embodiment of the presentinvention.

Referring to FIG. 12, a semiconductor substrate 100 such as a siliconwafer is separated into a field region 102 and an active region by atrench isolation process. The field region 102 of the substrate 100 isetched to form a field trench, and an isolation layer is formed in thefield trench. Thus, the active region of the substrate 100 iselectrically isolated from surroundings by the device isolation layer.

A gate trench 103 is recessed from a surface of the substrate 100, and agate electrode is formed in the gate trench in a subsequent process. Agate insulation layer is formed on the substrate 100 and on an innersurface of the gate trench 103, and then a gate conductive layer isformed on the gate insulation layer. A hard mask layer is formed on thegate conductive layer. The gate insulation layer comprises siliconoxide, and the gate conductive layer includes a polysilicon layer or acomposite layer having a polysilicon layer and a metal layer. Thecomposite layer may include the polysilicon layer and a metal silicidelayer in place of the metal layer. The hard mask layer comprises siliconnitride.

The hard mask layer is patterned to form a hard mask pattern 108, andthe gate conductive layer and the gate insulation layer are etched usingthe hard mask pattern 108 as an etching mask to form a gate conductivepattern 106 and a gate insulation pattern 104. That is, the gateinsulation pattern 104, the gate conductive pattern 106 and the hardmask pattern 108 that are sequentially stacked on the substrate 100 tocomplete a gate structure 110. A gate spacer 112 is formed along asidewall of the gate structure 110 on the substrate 100, and comprises asilicon nitride.

A selective epitaxial growth (SEG) process is conducted on the exposedsurface of the substrate 100 between the gate spacers 112 so thatsemiconductor materials are grown from the surface of the substrate 100to form a semiconductor pattern 114. The SEG process selectively formsthe semiconductor pattern 114 only on the exposed surface of thesubstrate 100 between the gate spacers 112. Thus, the semiconductorpattern 114 partially fills up a gap between the gate spacers 112.

A plurality of N type dopants are implanted onto the substrate 100including the semiconductor pattern 114.; Thus, first and secondimpurity regions 120 and 121 are formed in the semiconductor pattern 114and at surface portions of the substrate 100 as a source/drain of atransistor. In the first and second impurity regions 120 and 121, the Ntype dopants are heavily implanted onto the semiconductor pattern 114that contacts a contact pad in a subsequent process, and are lightlyimplanted at the surface of the substrate 100.

The surface portions of the semiconductor pattern 114 are heavily dopedwith the N type dopants and minimize an electrical resistance of thecontact pad. The surface of the substrate 100 is lightly doped with theN type dopants to reduce a reverse junction current and decrease thejunction leakage current. The first impurity region 120 makes anelectrical contact with a bit line in a subsequent process, and thesecond impurity region 121 makes an electrical contact with a capacitorin a subsequent process. Then, a plurality of P type dopants areimplanted at the surface of the substrate 100 to form a channel dopingregion 118 under the first impurity region 120, spaced apart from thesecond impurity region 121 by a predetermined distance.

A first insulation interlayer 116 is formed on the substrate 100 with asufficient thickness to cover the gate structure 110, and is partiallyetched to form a first contact hole through which a surface of thesemiconductor pattern 114 is exposed in the first and second impurityregions 120 and 121.

A conductive material is coated on the first insulation interlayer 116to with sufficient thickness to fill up the first contact hole to form aconductive layer (not shown) on the first insulation interlayer 116. Theconductive layer is then removed and planarized until a surface of thefirst insulation interlayer 116 is exposed so that the conductive layerremains only in the first contact hole to form a plurality of contactpads 122 through the first insulation interlayer 116. Hereinafter, thecontact pad 122 making an electrical contact with the first impurityregion 120 is referred to as a first contact pad 122 a, and the contactpad 122 making an electrical contact with the second impurity region 121is referred to as a second contact pad 122 b. A surface area of thesemiconductor pattern 114 is larger than that of the substrate 100between the gate structures 110. Thus, the contact pad 122 has a smallerelectrical resistance than when making direct contact with the substrate100 between the gate structures 110. As a result, a driving current ofthe transistor and an operation speed of the transistor are increased.

A second insulation interlayer 124 is formed on the first insulationinterlayer 116 and the contact pads 122, and is partially etched to forma second contact hole through which the first contact pad 122 a isexposed. Then, a conductive layer is formed on the second insulationinterlayer 124 with a sufficient thickness to fill up the second contacthole. The conductive layer is then patterned so that a bit line contact126 making an electrical contact with the first contact pad 122 a isformed in the second contact hole and a bit line 128 is formed to beconnected to the bit line contact 126.

A third insulation interlayer 130 is formed on the second insulationinterlayer 124, and the bit line 128 is covered with the thirdinsulation interlayer 130. The third insulation interlayer 130 and thesecond insulation interlayer 124 are sequentially and partially etchedto thereby form a third contact hole through which the second contactpad 122 b is exposed. A conductive layer is formed on the thirdinsulation interlayer 130 with a sufficient thickness to fill up thethird contact hole. The conductive layer is removed and planarized untilthe third insulation layer 130 is exposed so that the conductive layerremains in the third contact hole to form a storage node contact hole132. A cylindrical capacitor 134 is formed on the storage node contacthole 132 to complete the DRAM device shown in FIG. 12.

According to an embodiment of the present invention, the semiconductorpattern is formed on the substrate between the gate structures. Thus,the first and second impurity regions are extended to the semiconductorpattern from the substrate. Therefore, operation characteristics of thetransistor are not deteriorated although the depth of the gate trench issmaller than the conventional recessed gate trench. When the depth ofthe gate trench is reduced, a surface area of the gate insulation layeris reduced to minimize a word line loading effect.

FIGS. 13 to 15 are cross sectional views illustrating processing stepsfor manufacturing the DRAM device shown in FIG. 12 according to anembodiment of the present invention. The processing steps of the presentembodiment are substantially identical to those described in connectionwith FIGS. 2-6 except that the gate electrode is formed in the gatetrench to form a recessed transistor.

Referring to FIG. 13, a semiconductor substrate 100 such as a siliconwafer is separated into a field region 102 and an active region by atrench device isolation process. The field region of the substrate 100is etched to form a trench, and an isolation layer is formed in thetrench. Thus, the active region of the substrate 100 is electricallyisolated from surroundings by the device isolation layer.

A portion of the active region of the substrate 100 is selectivelyetched away and recessed to a predetermined depth to form a gate trench103 in which a gate electrode is formed in a subsequent process. Then,silicon oxide is formed on the substrate 100 and on an inner surface ofthe gate trench 103 as a gate insulation layer. A gate conductive layeris formed on the gate insulation layer, and a hard mask layer is formedon the gate conductive layer.

The hard mask layer is patterned to form a hard mask pattern 108, andthe gate conductive layer and the gate insulation layer are partiallyetched using the hard mask pattern 108 as an etching mask to form a gateconductive pattern 106 and a gate insulation pattern 104. As a result,the gate insulation pattern 104, the gate conductive pattern 106 and thehard mask pattern 108 are sequentially stacked on the substrate 100 tocomplete a gate structure 110.

Silicon nitride is coated on the substrate 100 with a sufficientthickness to cover the gate structure 110, and is anisotropically etcheduntil a surface of the substrate 100 is exposed. Accordingly, a gatespacer 112 is formed on a sidewall of the gate structure 110.

Referring to FIG. 14, a selective epitaxial growth (SEG) process isconducted on the exposed surface of the substrate 100 between the gatespacers 112 so that semiconductor materials are grown from the surfaceof the substrate 100 to form a semiconductor pattern 114. A photoresistis coated on the substrate 100 including the semiconductor pattern 114and the gate structure 110 to form a photoresist film (not shown) on thesubstrate 100, and the photoresist film is partially removed by exposingand developing processes to form a photoresist pattern 117. One of thesemiconductor patterns 114 between the gate structures 110 is exposedthrough the photoresist pattern 117.

Then, a plurality of P type dopants are implanted at the surface of thesubstrate 100 using the photoresist pattern 117 as an ion implantationmask to form a channel doping region 118 under the exposed semiconductorpattern 114. Accordingly, the channel doping region 118 is formed underthe exposed semiconductor pattern 114 and between the gate trenches 103that are adjacent to each other.

Referring to FIG. 15, the photoresist pattern 117 is removed by knownashing and strip processes. A plurality of N type dopants is implantedonto the substrate 100 including the semiconductor pattern 114. Thus,first and second impurity regions 120 and 121 are formed in thesemiconductor pattern 114 and at surface portions of the substrate 100as source/drain of a transistor. The implantation of the N type dopantsis controlled such that the first impurity region 120 is formed on thechannel doping region 118 between the gate trenches 103 so that thefirst impurity region 120 is surrounded by the channel doping region 118and the gate trenches 103.

In the first and second impurity regions 120 and 121, the N type dopantsare heavily implanted onto the semiconductor pattern 114 that contacts acontact pad in a subsequent process, and are lightly implanted at thesurface of the substrate 100.

Thereafter, the above processing steps described with reference to FIGS.1 and 6 are sequentially performed so that a bit line contacting thefirst impurity region 120 and a capacitor contacting the second impurityregion 121 are formed on the substrate 100 to complete the DRAM deviceshown in FIG. 12.

FIGS. 16 and 17 are cross sectional views illustrating processing stepsfor manufacturing the DRAM device shown in FIG. 12 according to anotherembodiment of the present invention. The processing steps of the presentembodiment are substantially identical to those described in connectionwith FIGS. 7-11 except that the gate electrode is formed in the gatetrench to form a recessed transistor.

Referring to FIG. 16, a gate structure 110 is formed in the gate trench103 of the semiconductor substrate 100 through the same processing stepsas described above with respect to FIG. 13. Then, a gate spacer 112 isformed on a sidewall of a portion of the gate structure 110 protrudedfrom the substrate 100. A semiconductor pattern 114 is formed on thesubstrate 100 between the gate spacers 112 by a SEG process.

Then, N type dopants are implanted onto the substrate 100 including thesemiconductor pattern 114. Thus, first and second impurity regions 120and 121 are formed in the semiconductor pattern 114 and at surfaceportions of the substrate 100 as a source/drain of a transistor. In thefirst and second impurity regions 120 and 121, the N type dopants areheavily implanted onto the semiconductor pattern 114 that contacts acontact pad in a subsequent process, and are lightly implanted at thesurface of the substrate 100. An electrical resistance of the contactpad is minimized at the surface portions of the semiconductor pattern114 due to the heavily doped N type dopants, and a reverse junctioncurrent is reduced at the surface of the substrate 100 due to thelightly doped N type dopants. As a result, the junction leakage currentis decreased.

Referring to FIG. 17, a first insulation interlayer 116 is formed on thesubstrate 100 with a sufficient thickness to cover the gate structure110, and is partially etched to form a first contact hole through whicha surface of the semiconductor pattern 114 is exposed in the first andsecond impurity regions 120 and 121. A conductive material is coated onthe first insulation interlayer 116 to a sufficient thickness to fill upthe first contact hole to form a conductive layer on the firstinsulation interlayer 116. The conductive layer is then removed andplanarized until a surface of the first insulation interlayer 116 isexposed so that the conductive layer remains only in the first contacthole to form a plurality of contact pads 122 through the firstinsulation interlayer 116. Hereinafter, the contact pad 122 making anelectrical contact with the first impurity region 120 is referred to asa first contact pad 122 a, and the contact pad 122 making an electricalcontact with the second impurity region 121 is referred to as a secondcontact pad 122 b. A surface area of the semiconductor pattern 114 islarger than that of the substrate 100 between the gate structures 110.Thus, the contact pad 122 has a smaller electrical resistance than whenmaking direct contact with the substrate 100 between the gate structures110. As a result, a driving current of the transistor is increased andan operation speed is also increased. In an embodiment of the presentinvention, the conductive material comprises polysilicon.

Then, a second insulation interlayer 124 is formed on the firstinsulation interlayer 116 and the contact pads 122. A photoresist filmis coated on the second insulation interlayer 124, and exposing anddeveloping processes are performed to form a photoresist pattern 160through which a portion of the second insulation interlayer 124corresponding to the first contact pad 122 a is exposed. Then, thesecond insulation interlayer 124 is etched using the photoresist pattern160 as an etching mask to form a second contact hole 162 through which atop surface of the first contact pad 122 a is exposed.

A plurality of P type dopants are implanted onto the substrate 100 usingthe photoresist pattern 160 as an ion implantation mask so that achannel-doping region 152 is formed under the first impurity region 120.Here, the P type dopants are implanted to an implantation depth greaterthan a junction depth of the first impurity region 120 so that thechannel-doping region 152 surrounds the first impurity region 120between the gate trenches 103 adjacent to each other. Thereafter, theabove processing steps described with reference to FIG. 11 are performedto complete the DRAM device shown in FIG. 12.

FIGS. 18 to 22 are cross sectional views illustrating processing stepsfor manufacturing a DRAM device according to still another exemplaryembodiment of the present invention.

Referring to FIG. 18, a semiconductor substrate 100 such as a siliconwafer is separated into a field region 102 and an active region by atrench isolation process. The field region 102 of the substrate 100 isetched to form a field trench, and an isolation layer is formed in thefield trench. The active region of the substrate 100 is electricallyisolated from surroundings by the isolation layer in the field trench ofthe field region 102.

A plurality of P type dopants are deeply implanted onto the substrate100 to form a field impurity region 101 under the field region 102, anda plurality of N type dopants are shallowly implanted onto the substrate100 to form an active impurity region 200 at surface portions of theactive region of the substrate 100. Alternatively, the processing stepfor forming the active impurity region 200 may be omitted.

Referring to FIG. 19, a portion of the active region of the substrate100 is selectively etched away and recessed to a predetermined depth toform a gate trench 103 in which a gate electrode is formed in asubsequent process and to separate the active impurity region 200 intoparts. Then, silicon oxide is formed on the substrate 100 and on aninner surface of the gate trench 103 as a gate insulation layer. A gateconductive layer is formed on the gate insulation layer, and a hard masklayer is formed on the gate conductive layer.

The hard mask layer is patterned to form a hard mask pattern 108, andthe gate conductive layer and the gate insulation layer are partiallyetched using the hard mask pattern 108 as an etching mask to form a gateconductive pattern 106 and a gate insulation pattern 104. As a result,the gate insulation pattern 104, the gate conductive pattern 106 and thehard mask pattern 108 are sequentially stacked on the substrate 100 tocomplete a gate structure 110.

A plurality of additional N type dopants are heavily implanted onto theseparated active impurity region 200 to form first and second impurityregions 202 and 203 as a source/drain of a transistor.

Referring to FIG. 20, a gate spacer 112 is formed on a sidewall of aportion of the gate structure 110 protruded from the substrate 100. Aplurality of additional N type dopants are lightly implanted onto thesubstrate 100 including the gate spacer 112 to form a lightly dopedimpurity region 204 below the first and second impurity regions 202 and203. The lightly doped impurity region 204 is formed at a positiondeeper than the first and second impurity regions 202 and 203 andshallower than a bottom of the gate trench 103. Alternatively, theprocessing step for forming the lightly doped impurity region 204 may beomitted.

Referring to FIG. 21, a first insulation interlayer 116 is formed on thesubstrate 100 with a sufficient thickness to cover the gate structure110, and is partially etched to form a first contact hole through whichsurfaces of the first and second impurity regions 202 and 203 areexposed. A conductive material is coated on the first insulationinterlayer 116 to a sufficient thickness to fill up the first contacthole to form a conductive layer (not shown) on the first insulationinterlayer 116. The conductive layer is then removed and planarizeduntil a surface of the first insulation interlayer 116 is exposed sothat the conductive layer remains only in the first contact hole to forma plurality of contact pads 122 through the first insulation interlayer116. Hereinafter, the contact pad 122 making an electrical contact withthe first impurity region 202 is referred to as a first contact pad 122a, and the contact pad 122 making an electrical contact with the secondimpurity region 203 is referred to as a second contact pad 122 b. In anembodiment of the present invention, the conductive material comprisespolysilicon.

A second insulation interlayer 124 is formed on the first insulationinterlayer 116 and the contact pads 122, and a photoresist film (notshown) is formed on the second insulation interlayer 124. Thephotoresist film is partially removed by known exposing and developingprocesses to form a photoresist pattern 128, through which the secondinsulation interlayer 124 is partially exposed corresponding to thefirst contact pad 122 a. The second insulation interlayer 124 is thenetched away using the photoresist pattern as an etching mask to form asecond contact hole 162 through which a top surface of the secondcontact pad 122 a is exposed. A plurality of P type dopants is implantedat surface portions of the substrate 100 using the photoresist pattern160 as an ion implantation mask to a depth greater than a junction depthof the first impurity region 202 to form a channel doping region 220under the first impurity region 202.

Thereafter, the above processing steps described with reference to FIG.11 are performed to complete the DRAM device shown in FIG. 22.

According to embodiments of the present invention, a channel dopingregion of a transistor contacts one of the impurity regions. Thus, ajunction leakage current is reduced at the impurity regions that do notcontact the channel-doping region. In addition, the semiconductorpattern on the substrate between the gate structures increases a contactarea of a contact pad to minimize an electrical resistance of thecontact pad and improve an operation characteristic of a DRAM device.

Although exemplary embodiments have been described herein with referenceto the accompanying drawings, it is to be understood that the presentinvention is not limited to those precise embodiments, and that variousother changes and modifications may be affected therein by one ofordinary skill in the related art without departing from the scope orspirit of the invention.

1. A method of manufacturing a semiconductor device, comprising: forminga plurality of gate trenches on a substrate by partially etching thesubstrate; forming a plurality of gate structures on the substrate,wherein a lower portion of at least some of the plurality of gatestructures is formed in the plurality of gate trenches; forming a gatespacer on a portion of a sidewall of each gate structure protruded fromthe substrate; forming a semiconductor pattern on the substrate betweenthe plurality of gate structures; forming a channel doping region in thesubstrate between predetermined adjacent gate spacers by implanting asecond conductive type impurity onto the semiconductor pattern; andforming a first impurity region and a second impurity region in thesemiconductor pattern and at surface portions of the substrate byimplanting a first conductive type impurity onto the semiconductorpattern, wherein the first impurity region is surrounded by the channeldoping region.
 2. The method of claim 1, wherein the semiconductorpattern is formed through a selective epitaxial growth (SEG) process. 3.The method of claim 1, wherein the second conductive type impurity isimplanted deeper than the first conductive type impurity for forming thechannel doping region under the first impurity region.
 4. The method ofclaim 1, further comprising: forming a first insulation interlayer tocover the plurality of gate structures; forming first and second contactpads through the first insulation interlayer, wherein the first contactpad contacts the first impurity region and the second contact padcontacts the second impurity region; forming a second insulationinterlayer on the first insulation interlayer and the first and secondcontact pads; forming a bit line on the second insulation interlayer,wherein the bit line includes a bit line contact formed through thesecond insulation interlayer for contacting the first contact pad;forming a third insulation interlayer on the second insulationinterlayer to cover the bit line; forming a storage node contact throughthe third insulation interlayer, wherein the storage node contactcontacts the second contact pad; and forming a capacitor on the storagenode contact.